Thin Films & Physics of Nanostructures - Equipment

BESTEC thin film deposition system 

• ultra high vacuum system with loadlock
• vacuum chamber for magnetron (co)-sputter deposition (DC or RF mode)
• vacuum chamber for molecular beam epitaxy
• sample heating (up to 1000°C)
• in-situ resistance and magneto-resistance measurements

• https://en.wikipedia.org/wiki/Sputter_deposition

• https://en.wikipedia.org/wiki/Molecular-beam_epitaxy

SENTECH atomic layer deposition system

• thermal and plasma enhanced deposition
• up to 100mm samples
• deposition temperatures from room temperature up to 300℃
• extremely uniform and conform oxide- and nitride-layers

• https://en.wikipedia.org/wiki/Atomic_layer_deposition

BesTec 3 inch Co-Sputtering System

• sputter deposition
• eight three inch sources, DC or RF mode
• ultra high vacuum
• sample heating (1000°C) and rotation
• 10 kW electron beam evaporator
• 1kW rapid thermal annealing unit

Leybold CLAB600

• sputter deposition
• six four inch sources, DC or RF mode
• high vacuum
• automatic sample handling
• plasma oxidation chamber

BesTec 2 inch Co-Sputtering System

• sputter deposition
• four two inch sources, DC or RF mode
• ultra high vacuum
• sample heating (1000°C) and rotation
• in-situ resistance measurement option

Insulator Sputtering (self-made system)

• DC or RF reactive sputtering
• ultra high vacuum
• TaOx, SiO2, Ta, Au

Transmission electron microscopy

• JEOL JEM 2200 FS
• In operando analytical high resolution transmission electron microscopy

• https://en.wikipedia.org/wiki/Transmission_electron_microscopy

FEI Helios NanoLab DualBeam Focused Ion Beam

• Ga ion beam
• nano-manipulator
• scanning electron microscope
• EDX for mapping
• 3D tomography

• https://en.wikipedia.org/wiki/Focused_ion_beam

• https://en.wikipedia.org/wiki/Scanning_electron_microscope

Zeiss LEO 1530 Scanning Electron Microscope

• 5-20kV operating voltage
• high vacuum
• EDX detector
• Raith laser interferometer sample stage for electron beam lithography

Scanning Auger microscopy

• Physical Electronics Phi660
• surface sensitive analysis of composition
• depth profiling (Ar ion etching / spectroscopy), Zalar rotation for optimized depth resolution

• https://en.wikipedia.org/wiki/Auger_electron_spectroscopy

Annealing furnace

• sample temperature up to 550°C
• ultra high vacuum
• field cooling option (0.65T)

Ion Beam Etching system

• low-voltage ion beam (up to 1.2keV)
• ultra high vacuum
• secondary ion mass spectroscopy (SIMS) for in-situ monitoring of the etching depth

TPT HB 16 Bonder

• Al or Au wire
• ball and wedge bonding

• https://en.wikipedia.org/wiki/Wire_bonding

SMART PRINT System (microlight3D)

• maskless lithography system based on DMD projection technology

3rd Generation MPMS SQUID Magnetometer (Quantum Design)

• with evercool close-cycle system - 7.0 Tesla magnet
• vibrating sample magnetometer (VSM) extraktions Modus
• electrical transport option (ETO) for MPMS3

• https://en.wikipedia.org/wiki/SQUID

• https://en.wikipedia.org/wiki/Vibrating-sample_magnetometer

Philips X'Pert Pro MPD x-ray diffractometer

• theta-2theta geometry

• Cu K-alpha source

• Bragg-Brentano optics

• open Euler cradle

• LN2 chamber for cryo measurements

• x-ray reflectivity (XRR)

• small angle x-ray scattering (SAXS)

• https://en.wikipedia.org/wiki/X-ray_diffraction

• https://en.wikipedia.org/wiki/X-ray_reflectivity

   

x-ray fluorescence (XRF) analysis of composition of thin films and bulk samples

• Amptek XR-100CR x-ray fluorescence detector
• Amptek Miniature x-ray source (Ag), 10keV to 50keV
• He atmosphere in the sample space for elements down to Al

• https://en.wikipedia.org/wiki/X-ray_fluorescence

Magneto-optical Kerr effect (MOKE)

• Vector MOKE:

  • 3-axis magnet (0.35T)

  • perpendicular or 45° incident light

  • sample rotation and heating

  • Kerr rotation and ellipticity

  • different wavelengths

• 2T MOKE:

  • Bruker electromagnet (up to 2T)

  • polar and longitudinal geometry

  • 650nm Laser

  • s- or p-polarized incident light

• https://en.wikipedia.org/wiki/Magneto-optic_Kerr_effect

Cryogenic Ltd. Cryostat system

• closed cycle He cryostat (1.2 K)
• 3He dilution insert (0.3K)
• 4T superconducting magnet + 0.5T transverse field
• for all kinds of temperature dependent transport measurements

Atomic Force Microscope Bruker Multimode 5

• tapping mode & contact mode
• magnetic force mode (MFM)
• conducting AFM

• https://en.wikipedia.org/wiki/Atomic_force_microscopy

Variety of setups for...

• temperature dependent magneto-resistance measurements
• spin-transfer-torque measurements
• spin-orbit-torque measurements
• spin-caloric characterization (rotatable thermal gradients up to 30K in rotatable magnetic fields of up to 0.1T)
• ...

Introduction to the field:

• https://en.wikipedia.org/wiki/Spintronics

• https://en.wikipedia.org/wiki/Magnetoresistance

• https://en.wikipedia.org/wiki/Spin-transfer_torque